论文标题
一种联合校准技术，用于提高基于RF的血浆设备同步操作期间电压和电流探针的测量精度
A Joint Calibration Technique for Improving Measurement Accuracy of Voltage and Current Probes During Synchronous Operation for RF Based Plasma Devices
论文作者
论文摘要
本文提出了电压（V）和电流（i）探针的联合校准方案，该方案有助于准确解决电压电流相位差，即使差异非常接近$ 90^{\ circ} $。当与微型RF等离子体设备（如大气压力等离子体射流（APPJ））一起使用时，后者是V-1探针的主要问题。由于这种微型设备的阻抗主要是电容的，因此电压和当前信号之间的相位差异接近$ 90^{\ circ} $。但是，事实证明，当V-I探针与没有关节校准的设备一起使用时，这些探针通常会超过$ 90^{\ circ} $。同样，由于功率吸收与阻抗的电阻部分成正比，因此当它接近$ \ of $ \ of of $ \ of90^{\ circ} $时，它变得非常敏感。因此，重要的是能够准确地解决阶段。校准后，V-1探针对于确定平均RF功率$ p_ {av} $，等离子体阻抗$ z_p $，等等的tepical tepical后校准后v-i数据收益率，$ zp \ zp \ zp \约93.6- j 1139 $ p _ $ j 1139ω{81.5-j 1173ω{ helium（氩气）气体的W $ $（\约7.7 w）$。
This paper presents a joint calibration scheme for voltage (V) and current (I) probes that helps resolve accurately voltage-current phase differences even when the difference is very close to $90^{\circ}$. The latter has been a major issue with V-I probes when used with miniature RF plasma devices like the atmospheric pressure plasma jet (APPJ). Since the impedance of such miniature devices is predominantly capacitive, the phase difference between the voltage and current signals is very nearly $90^{\circ}$. It turns out, however, that when V-I probes are used with such devices without joint calibration, these frequently yield phase shifts over $90^{\circ}$. Also, since power absorption is proportional to the resistive part of the impedance it becomes very sensitive to the phase difference when it is close to $\approx90^{\circ}$. Thus, it is important to be able to resolve the phases accurately. Post-calibration, V-I probes would be indispensable for the electrical characterization of APPJs for determining average RF power $P_{av}$, plasma impedance $Z_p$, etc.Typical post-calibration V-I data yields, $Zp \approx 93.6 - j 1139 Ω (81.5 - j 1173 Ω)$ at $P_{av} \approx 9.8 W$ $(\approx7.7 W)$ for helium (argon) gas.
