论文标题
辐照薄膜中纳米图的临界角的物理机制：ii。碰撞级联详细信息
Physical mechanisms affecting critical angle for nanopatterning in irradiated thin films: II. Collision cascade details
论文作者
论文摘要
不合格材料（例如Si或ge）的离子梁照射可能会导致自发的图案形成，超出了梁与表面的一定临界角度。从实验结果中知道，该临界角度根据束能，离子物种和靶材料而变化。但是，大多数流行的理论分析预测$ 45^{\ circ} $的临界角度独立于能量，离子和目标，与实验不同意。 In this second part of a set of papers, we consider the influence of the relationship between the upper and lower interfaces of the amorphous thin film (the ``interface relation"). From our previous work, we are motivated to derive from a geometric argument closed-form expressions describing the interface relation in terms of the collision cascade shape. This feature leads to a refined characterization of the influence of ion-, target- and energy-dependence on critical angle selection.
Ion-beam irradiation of an amorphizable material such as Si or Ge may lead to spontaneous pattern formation beyond some critical angle of the beam versus the surface. It is known from experimental results that this critical angle varies according to beam energy, ion species and target material. However, most prevailing theoretical analyses predict a critical angle of $45^{\circ}$ independent of energy, ion and target, disagreeing with experiment. In this second part of a set of papers, we consider the influence of the relationship between the upper and lower interfaces of the amorphous thin film (the ``interface relation"). From our previous work, we are motivated to derive from a geometric argument closed-form expressions describing the interface relation in terms of the collision cascade shape. This feature leads to a refined characterization of the influence of ion-, target- and energy-dependence on critical angle selection.
