论文标题

在拓扑结晶步骤边缘的1D平面带中的相互作用效果

Interaction effects in a 1D flat band at a topological crystalline step edge

论文作者

Wagner, Glenn, Das, Souvik, Jung, Johannes, Odobesko, Artem, Küster, Felix, Keller, Florian, Korczak, Jedrzej, Szczerbakow, Andrzej, Story, Tomasz, Parkin, Stuart, Thomale, Ronny, Neupert, Titus, Bode, Matthias, Sessi, Paolo

论文摘要

拓扑晶体绝缘子的步骤边缘可以看作是高阶拓扑的前身,因为它们体现了嵌入在有效的三维电子真空中,从拓扑结晶绝缘子发出的有效的三维电子真空中。使用扫描隧道显微镜和光谱学,我们研究了pb $ _ {1-x} $ sn $ _ {x} $ se在掺杂下的Edge通道的行为。一旦将阶梯边缘的能量位置带到费米水平附近,我们就会观察到相关间隙的开口。实验结果是根据相互作用效应而合理化的,因为电子密度折叠到一维通道,这些效应得到了增强。这构成了一个独特的系统,用于研究拓扑和多体电子效应如何通过Hartree-fock分析对其进行建模。

Step edges of topological crystalline insulators can be viewed as predecessors of higher-order topology, as they embody one-dimensional edge channels embedded in an effective three-dimensional electronic vacuum emanating from the topological crystalline insulator. Using scanning tunneling microscopy and spectroscopy we investigate the behaviour of such edge channels in Pb$_{1-x}$Sn$_{x}$Se under doping. Once the energy position of the step edge is brought close to the Fermi level, we observe the opening of a correlation gap. The experimental results are rationalized in terms of interaction effects which are enhanced since the electronic density is collapsed to a one-dimensional channel. This constitutes a unique system to study how topology and many-body electronic effects intertwine, which we model theoretically through a Hartree-Fock analysis.

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