论文标题
单一整合的主动无源波导阵列，使用单个连续光刻过程在薄膜锂锂制造
Monolithically integrated active passive waveguide array fabricated on thin film lithium niobate using a single continuous photolithography process
论文作者
论文摘要
我们通过平铺无源（即，无活性离子）薄膜硅锂（TFLN）和活性（即用稀土离子掺杂）TFLN底物来证明具有强大的低损坏光学界面，以实现无源/活性锂niobate Niobate Photonics的整体化整合。由主动区域和被动区域组成的瓷砖底物可以使用单个连续的光刻过程立即对集成活跃的被动光子设备的掩码进行对。瓷砖底物的界面损失低至0.26 dB。得益于这种方法提供的稳定性，以一种直接的方式实现了四通道波导放大器，在1550 nm波长下显示了〜5 dB的净增益，每个通道的波长为〜8 dB。用于被动/主动光子积分的强大低损耗光学界面将有助于大规模的高性能光子设备，这些设备需要芯片光源和放大器。
We demonstrate a robust low-loss optical interface by tiling passive (i.e., without doping of active ions) thin film lithium niobate (TFLN) and active (i.e., doped with rare earth ions) TFLN substrates for monolithic integration of passive/active lithium niobate photonics. The tiled substrates composed of both active and passive areas allow to pattern the mask of the integrated active passive photonic device at once using a single continuous photolithography process. The interface loss of tiled substrate is measured as low as 0.26 dB. Thanks to the stability provided by this approach, a four-channel waveguide amplifier is realized in a straightforward manner, which shows a net gain of ~5 dB at 1550-nm wavelength and that of ~8 dB at 1530-nm wavelength for each channel. The robust low-loss optical interface for passive/active photonic integration will facilitate large-scale high performance photonic devices which require on-chip light sources and amplifiers.
