论文标题
BI0.1Y2.9FE5O12高频应用的薄膜的生长参数
Growth parameters of Bi0.1Y2.9Fe5O12 thin films for high frequency applications
论文作者
论文摘要
据报道，据报道，抗鞭毛（BI）取代的YIG（BI-YIG，BI0.1Y2.9FE5O12）薄膜的生长和表征。脉冲激光沉积（PLD）膜的厚度范围为20至150 nm。考虑了两个（100）和（111）的底物方向。观察到沿十二面体位点（111）的BI3+离子的分布增强，导致晶格常数从（100）中的12.379 Angstrom增加到（100）到面向（111）的膜中的12.415 Angstrom。原子力显微镜图像显示，随着膜厚度的增加，粗糙度降低。与（100）个成年膜相比，（111）面向（111）的薄膜显示出铁磁共振线的增加，随之而来的是吉尔伯特阻尼的增加。发现最低的吉尔伯特阻尼值为（1.06） * 10E-4，对于（100）和（2.30） * 10E-4，对于（111）面向厚度为150 nm的膜。观察到的外部线宽，有效磁化和各向异性场的值与膜和底物方向的厚度有关。此外，与（111）沉积膜不同的（100）沉积膜的平面角变化为（100）沉积膜建立了四倍的对称性。这项研究规定了PLD生长的单晶二叶薄膜的生长条件，该薄膜针对所需的高频和磁光设备应用。
The growth and characterization of Bismuth (Bi) substituted YIG (Bi-YIG, Bi0.1Y2.9Fe5O12) thin films are reported. Pulsed laser deposited (PLD) films with thicknesses ranging from 20 to 150 nm were grown on Gadolinium Gallium Garnet substrates. Two substrate orientations of (100) and (111) were considered. The enhanced distribution of Bi3+ ions at dodecahedral site along (111) is observed to lead to an increment in lattice constant from 12.379 angstrom in (100) to 12.415 angstrom in (111) oriented films. Atomic force microscopy images showed decreasing roughness with increasing film thickness. Compared to (100) grown films, (111) oriented films showed an increase in ferromagnetic resonance linewidth and consequent increase in Gilbert damping. The lowest Gilbert damping values are found to be (1.06) * 10E-4 for (100) and (2.30) * 10E-4 for (111) oriented films with thickness of 150 nm. The observed values of extrinsic linewidth, effective magnetization, and anisotropic field are related to thickness of the films and substrate orientation. In addition, the in-plane angular variation established four-fold symmetry for the (100) deposited films unlike the case of (111) deposited films. This study prescribes growth conditions for PLD grown single-crystalline Bi-YIG films towards desired high frequency and magneto-optical device applications.
