论文标题

通过基材模式耦合在罪共振器中进行的机械耗散

Mechanical dissipation by substrate-mode coupling in SiN resonators

论文作者

de Jong, Matthijs H. J., Wolde, Malte A. ten, Cupertino, Andrea, Gröblacher, Simon, Steeneken, Peter G., Norte, Richard A.

论文摘要

最先进的纳米力学谐振器是下一代时钟,过滤器,谐振传感器和量子技术的核心组成部分。实际构建这些技术将需要微芯片,谐振器和读出系统的整体整合。虽然可以广泛认为将微芯片底物安装到系统中可以极大地影响高Q谐振器的性能,但由于影响耗散的各种物理过程和因素,系统的研究仍然难以捉摸。在这里,我们分析了一种机制,通过该机制,通过该机制,通过该机制,通过该机制在其上产生了谐振器,并在实验上证明,当谐振器和底物的谐振频率重合时,这种耦合可以增加纳米力学谐振器的机械耗散。然后,我们在两个相邻的谐振器之间显示出类似的耦合机制。由于底物模式耦合机制在很大程度上取决于底物上的谐振器位置和底物的安装,因此该工作为高精度纳米力学技术提供了关键的设计指南。

State-of-the-art nanomechanical resonators are heralded as a central component for next-generation clocks, filters, resonant sensors and quantum technologies. To practically build these technologies will require monolithic integration of microchips, resonators and readout systems. While it is widely seen that mounting microchip substrates into a system can greatly impact the performance of high-Q resonators, a systematic study has remained elusive, owing to the variety of physical processes and factors that influence the dissipation. Here, we analytically analyze a mechanism by which substrates couple to resonators manufactured on them, and experimentally demonstrate that this coupling can increase the mechanical dissipation of nanomechanical resonators when the resonance frequencies of resonator and substrate coincide. More generally, we then show a similar coupling mechanism can exist between two adjacent resonators. Since the substrate-mode coupling mechanism strongly depends on both the resonator position on the substrate and the mounting of the substrate, this work provides key design guidelines for high-precision nanomechanical technologies.

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