论文标题
嵌入量子发射器的混合光子设备的热释放胶带辅助半导体膜转移过程
Thermal release tape-assisted semiconductor membrane transfer process for hybrid photonic devices embedding quantum emitters
论文作者
论文摘要
能够结合不同的材料可以利用在单个材料系统中找不到或利用的不同属性和设备工程。 In quantum nano-photonics, one might want to increase the device functionalities by, for instance, combining efficient classical and quantum light emission available in III-V semiconductors, low-loss light propagation accessible in silicon-based materials, fast electro-optical properties of lithium niobate and broadband reflectors and/or buried metallic contacts for local electric field application or electrical injection of emitters.我们建议使用热释放胶带辅助过程的自制膜阵列及其沉积及其沉积在宿主材料上,提出一种转移打印技术。这种方法是多才多艺的,因为它对转移和宿主材料的限制有限。特别是,我们将190 nm厚的GAAS膜转移,尺寸高达约260美元$ $ m x 80 $ $ m $ m,含有Inas量子点,并将其转移到金基板上。我们表明,从单个量子点线中,背部反射器与微柱的蚀刻相结合,显着提高了量子光的提取效率,从单个量子点线到达光子通量,超过了8 x 10 $^5 $光子,每秒超过每秒的四倍,是从同一chip上测得的最高计数,从同一chip中,从同一chip中,从柱子外部发出的发明器。鉴于该过程的多功能性和易度性,该技术为实现混合量子和纳米光子设备的实现开辟了道路,这些设备几乎可以结合任何可以削弱的材料以实现未经启用的膜,然后将其转移到任何宿主底物上,而没有特定的兼容性问题和/或要求。
Being able to combine different materials allows taking advantage of different properties and device engineering that cannot be found or exploited within a single material system. In quantum nano-photonics, one might want to increase the device functionalities by, for instance, combining efficient classical and quantum light emission available in III-V semiconductors, low-loss light propagation accessible in silicon-based materials, fast electro-optical properties of lithium niobate and broadband reflectors and/or buried metallic contacts for local electric field application or electrical injection of emitters. We propose a transfer printing technique based on the removal of arrays of free-standing membranes and their deposition onto a host material using a thermal release adhesive tape-assisted process. This approach is versatile, in that it poses limited restrictions on the transferred and host materials. In particular, we transfer 190 nm-thick GaAs membranes, with dimensions up to about 260$μ$m x 80$μ$m, containing InAs quantum dots, onto a gold substrate. We show that the presence of a back reflector combined with the etching of micro-pillars significantly increases the extraction efficiency of quantum light, reaching photon fluxes, from a single quantum dot line, exceeding 8 x 10$^5$ photons per second, which is four times higher than the highest count rates measured, on the same chip, from emitters outside the pillars. Given the versatility and the ease of the process, this technique opens the path to the realisation of hybrid quantum and nano-photonic devices that can combine virtually any material that can be undercut to realise free-standing membranes that are then transferred onto any host substrate, without specific compatibility issues and/or requirements.