论文标题

保持深度光刻模拟器的更新:基于全局形状的新颖性检测和主动学习

Keeping Deep Lithography Simulators Updated: Global-Local Shape-Based Novelty Detection and Active Learning

论文作者

Shao, Hao-Chiang, Ping, Hsing-Lei, Chen, Kuo-shiuan, Su, Weng-Tai, Lin, Chia-Wen, Fang, Shao-Yun, Tsai, Pin-Yian, Liu, Yan-Hsiu

论文摘要

已经提出了基于学习的前模拟(即布局到制造)模型,以预测制造诱导的形状变形从IC布局到其制造电路。这样的模型通常是由成对学习驱动的,涉及布局模式的训练集及其在制造后的参考形状图像。但是,收集用于模型培训和更新的所有布局剪辑的参考形状图像是昂贵且耗时的。为了解决这个问题,我们提出了一种基于深度学习的布局新颖性检测方案,以识别新颖的(看不见)的布局模式,该模式无法通过预先训练的预测前模型来很好地预测。我们通过利用两个子网:自动编码器和预验证的预测模型来评估布局的潜在新颖性来评估布局的潜在新颖性。前者表征给定布局和训练样本之间的全球结构差异,而后者则提取了代表制造引起的局部变形的潜在代码。通过将全局差异与自我发场机制增强的局部变形相结合,我们的模型可以准确地检测新颖性,而无需测试样品的地面真相电路形状。基于发现的新颖性,我们进一步提出了两种主动学习策略,以品尝最值得制造的代表性布局,以获取其地面真相电路形状。实验结果证明了i)我们的方法在布局新颖性检测中的有效性,ii)我们主动学习策略在选择代表性的新布局方面具有以保持基于学习的预测模型更新的能力。

Learning-based pre-simulation (i.e., layout-to-fabrication) models have been proposed to predict the fabrication-induced shape deformation from an IC layout to its fabricated circuit. Such models are usually driven by pairwise learning, involving a training set of layout patterns and their reference shape images after fabrication. However, it is expensive and time-consuming to collect the reference shape images of all layout clips for model training and updating. To address the problem, we propose a deep learning-based layout novelty detection scheme to identify novel (unseen) layout patterns, which cannot be well predicted by a pre-trained pre-simulation model. We devise a global-local novelty scoring mechanism to assess the potential novelty of a layout by exploiting two subnetworks: an autoencoder and a pretrained pre-simulation model. The former characterizes the global structural dissimilarity between a given layout and training samples, whereas the latter extracts a latent code representing the fabrication-induced local deformation. By integrating the global dissimilarity with the local deformation boosted by a self-attention mechanism, our model can accurately detect novelties without the ground-truth circuit shapes of test samples. Based on the detected novelties, we further propose two active-learning strategies to sample a reduced amount of representative layouts most worthy to be fabricated for acquiring their ground-truth circuit shapes. Experimental results demonstrate i) our method's effectiveness in layout novelty detection, and ii) our active-learning strategies' ability in selecting representative novel layouts for keeping a learning-based pre-simulation model updated.

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