论文标题
使用太阳耀斑中的Si IV共振线的强度比诊断光学厚/薄的特征
Diagnosing the Optically Thick/Thin Features Using the Intensity Ratio of Si IV Resonance Lines in Solar Flares
论文作者
论文摘要
在光学较薄的状态下,两个SI IV共振线(1394和1403Å)的强度比与其振荡器强度的比率相同,这正是2。在这里,我们研究了SI IV线的综合强度的比率($ r = \ int i = \ int i_ i_ i _ {1394}(dry Int {d) I_ {1403}(λ)\ MathRM {D}λ$)和每个波长点处的强度比($ r(Δλ)= i_ {1394}(δλ)/i_ {1403}(Δλ)(δλ)$在两个solar Flares中,在两个solar flares中,以对方的界面图像进行了图像图。我们发现,在耀斑丝带上,比率$ r $从1.8到2.3不等,并且当丝带横穿狭缝位置时,通常会减少。此外,$ r(δλ)$的分布显示了从蓝翼到红翼的下降趋势。在循环案例中,Si IV线呈现出中央逆转的广泛轮廓。比率$ r $与2差异很小,但是比率$ r(δλ)$从线中心附近的1.3到线圈中的2大于2不等。因此,我们得出的结论是,在耀斑条件下,由于线中心和线机翼的不透明度的变化,比率$ r(δλ)$在整个线上有所不同。我们注意到,尽管比率$ r(δλ)$可能会提出一个值,该值与线中心附近的不透明度效应偏离了2,但比率$ r $仍接近2。
In the optically thin regime, the intensity ratio of the two Si IV resonance lines (1394 and 1403 Å ) are theoretically the same as the ratio of their oscillator strengths, which is exactly 2. Here, we study the ratio of the integrated intensity of the Si IV lines ($R=\int I_{1394}(λ)\mathrm{d}λ/\int I_{1403}(λ)\mathrm{d}λ$) and the ratio of intensity at each wavelength point ($r(Δλ)=I_{1394}(Δλ)/I_{1403}(Δλ)$) in two solar flares observed by the Interface Region Imaging Spectrograph. We find that at flare ribbons, the ratio $R$ ranges from 1.8 to 2.3 and would generally decrease when the ribbons sweep across the slit position. Besides, the distribution of $r(Δλ)$ shows a descending trend from the blue wing to the red wing. In loop cases, the Si IV line presents a wide profile with a central reversal. The ratio $R$ deviates little from 2, but the ratio $r(Δλ)$ can vary from 1.3 near the line center to greater than 2 in the line wings. Hence we conclude that in flare conditions, the ratio $r(Δλ)$ varies across the line, due to the variation of the opacity at the line center and line wings. We notice that, although the ratio $r(Δλ)$ could present a value which deviates from 2 as a result of the opacity effect near the line center, the ratio $R$ is still close to 2. Therefore, caution should be taken when using the ratio of the integrated intensity of the Si IV lines to diagnose the opacity effect.