论文标题
优化锆洛伊-4的宽离子光束抛光用于电子反向衍射分析
Optimizing broad ion beam polishing of zircaloy-4 for electron backscatter diffraction analysis
论文作者
论文摘要
电子反向散射衍射（EBSD）的微观结构分析涉及截面和抛光，以创建平坦的制备艺术作品的自由表面。 EBSD分析的质量通常取决于此步骤，这激发了我们探索如何优化宽离子束（BIB）铣削，以制备具有不同晶粒尺寸的锆洛伊-4。我们系统地探索离子束角，离子束电压，抛光持续时间和抛光温度的作用，以及如何改变表面粗糙度和索引质量。我们的结果提供了一种常规准备高质量锆-4表面的方法，以及优化其他材料的BIB抛光方法进行高质量EBSD研究的方法。
Microstructural analysis with electron backscatter diffraction (EBSD) involves sectioning and polishing to create a flat and preparation-artifact free surface. The quality of EBSD analysis is often dependant on this step, and this motivates us to explore how broad ion beam (BIB) milling can be optimised for the preparation of zircaloy-4 with different grain sizes. We systematically explore the role of ion beam angle, ion beam voltage, polishing duration and polishing temperature and how this changes the surface roughness and indexing quality. Our results provide a method to routinely prepare high-quality Zircaloy-4 surfaces, and methods to optimise BIB polishing of other materials for high-quality EBSD studies.
