论文标题

反铁磁铁中的原子锋利的域壁

Atomically sharp domain walls in an antiferromagnet

论文作者

Krizek, Filip, Reimers, Sonka, Kašpar, Zdeněk, Marmodoro, Alberto, Michalička, Jan, Man, Ondřej, Edstrom, Alexander, Amin, Oliver J., Edmonds, Kevin W., Campion, Richard P., Maccherozzi, Francesco, Dnes, Sarnjeet S., Zubáč, Jan, Železný, Jakub, Výborný, Karel, Olejník, Kamil, Novák, Vít, Rusz, Jan, Idrobo, Juan C., Wadley, Peter, Jungwirth, Tomas

论文摘要

了解磁纹理(例如域壁)的缩放限制的兴趣跨越了整个磁场,从其相对论量子基本原理到信息技术的应用。该领域的传统焦点最近开始向抗铁磁铁转移,这些反铁磁铁在超快速和神经形态设备中提供了丰富的材料景观和实用性,对磁场扰动不敏感。在这里,我们报告了一个观察结果,即抗铁磁cumnas的外延晶体中的结构壁在原子上可能是锋利的。我们使用差异校正透射电子显微镜中的差分相对比成像揭示了这种最终的域壁缩放极限,我们通过X射线磁性二色症显微镜和从头算计算进行补充。我们强调,原子上锋利的域壁不在已建立的自旋 - 哈米尔顿理论的汇率之外,并且可以在铁磁体中提供无与伦比的设备功能。

The interest in understanding scaling limits of magnetic textures such as domain walls spans the entire field of magnetism from its relativistic quantum fundamentals to applications in information technologies. The traditional focus of the field on ferromagnets has recently started to shift towards antiferromagnets which offer a rich materials landscape and utility in ultra-fast and neuromorphic devices insensitive to magnetic field perturbations. Here we report the observation that domain walls in an epitaxial crystal of antiferromagnetic CuMnAs can be atomically sharp. We reveal this ultimate domain wall scaling limit using differential phase contrast imaging within aberrationcorrected scanning transmission electron microscopy, which we complement by X-ray magnetic dichroism microscopy and ab initio calculations. We highlight that the atomically sharp domain walls are outside the remits of established spin-Hamiltonian theories and can offer device functionalities unparalleled in ferromagnets.

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