论文标题

通过使用碰撞辐射模型在电容耦合的AR等离子体I中诊断电子密度和温度:三频排放

Diagnosis of electron density and temperature by using collisional radiative model in capacitively coupled Ar plasmas I: triple-frequency discharges

论文作者

Zheng, Hao, Wu, Jidun, Cao, Qilu, Zhang, Jiaojiao, Huang, Xiaojiang

论文摘要

建立了适合低压的18级氩气辐射模型(CRM)。可以通过将光学发射光谱(OES)与Langmuir探针校准相结合来解决该模型。在具有不同频率和功率的电容性耦合等离子体(CCP)中,将模型获得的电子温度和密度与Langmuir探针测量的电子温度和密度进行了比较。发现在任何频率或功率下的校准点适合固定压力。然后将此方法应用于三频(TF)CCP的诊断,这表明高频(HF)功率主要控制电子密度,低频(LF)功率主要控制电子温度,并且中间频率(如果)在两者之间。与双频(DF)CCP相比,发现随着功率的增加,HF功率可以更独立地控制电子密度,而对电子温度的影响较小。

An 18-level argon collisional radiative model (CRM) suitable for low pressure was established. The model can be solved by combining the optical emission spectroscopy (OES) with Langmuir probe calibration. In the capacitively coupled plasmas (CCPs) with different frequency and power, the electron temperature and density obtained by the model were compared with those measured by Langmuir probe. It is found that the calibration point at any frequency or power is suitable for the fixed pressure. This method was then applied to the diagnosis of triple-frequency (TF) CCPs, it is shown that the high frequency (HF) power mainly controls the electron density, the low frequency (LF) power mainly controls the electron temperature, and the intermediate frequency (IF) power was between the two. Compared with the dual-frequency (DF) CCPs, it is found that with the increase of IF power, the HF power can control the electron density more independently with less influence on the electron temperature.

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