论文标题
扫描透射电子断层扫描和硅金属的电子能量损失光谱
Scanning Transmission Electron Tomography and Electron Energy Loss Spectroscopy of Silicon Metalattices
论文作者
论文摘要
传输电子显微镜，扫描传输电子断层扫描和电子能量损失光谱法被用来表征称为“ Metalattices”的三维人造si纳米结构，重点是由30-NM Collodal Silica模板中的高压力限制化学蒸气在30-NM collodal Silica模板中与〜7和〜12 nm 〜metA的si-nm collodal collodal semattions合成。 “元原子”密切复制面部键入的立方胶体硅胶模板的四面体和八面体间质位点的形状。 Metalattice由无定形或纳米晶硅组成，在二维显微照片和三维重建中表现出长距离顺序和互连性。电子能量损失光谱提供了有关局部电子结构的信息。与散装Si的发作相比，Si L2,3核心边缘是蓝移的，元键比两种类型的元原子（0.30和0.17 eV）显示出更大的偏移（0.55 eV）。使用经验紧密结合方法的状态计算的局部密度是合理的一致性。
Transmission electron microscopy, scanning transmission electron tomography, and electron energy loss spectroscopy were used to characterize three-dimensional artificial Si nanostructures called "metalattices", focusing on Si metalattices synthesized by high-pressure confined chemical vapor deposition in 30-nm colloidal silica templates with ~7 and ~12 nm "meta-atoms" and ~2 nm "meta-bonds". The "meta-atoms" closely replicate the shape of the tetrahedral and octahedral interstitial sites of the face-entered cubic colloidal silica template. Composed of either amorphous or nanocrystalline silicon, the metalattice exhibits long-range order and interconnectivity in two-dimensional micrographs and three-dimensional reconstructions. Electron energy loss spectroscopy provides information on local electronic structure. The Si L2,3 core-loss edge is blue-shifted compared to the onset for bulk Si, with the meta-bonds displaying a larger shift (0.55 eV) than the two types of meta-atoms (0.30 and 0.17 eV). Local density of state calculations using an empirical tight binding method are in reasonable agreement.
