论文标题
缺陷耐受装置的几何形状
Defect tolerant device geometries
论文作者
论文摘要
术语缺陷耐受性在文献中广泛用于描述诸如铅卤化物之类的材料,这些材料表现出长长的非辐射寿命,尽管具有大量的点缺陷。关于材料缺陷耐受性的研究主要研究宿主材料的特性和/或影响缺陷捕获系数的缺陷的化学性质。但是,缺陷的重组活性不仅是其捕获系数的函数,而且还取决于静电和光伏设备层堆栈的设计。在这里,我们通过将捕获系数的计算与设备仿真相结合,研究了设备几何形状对缺陷耐受性的影响。我们得出通用的设备设计原理,该设计原理可以根据给定的捕获系数抑制一组捕获系数的重组,以减慢两个过程(电子和孔捕获)的速度减慢,通过将电子和孔注入进一步修改吸收层。我们使用材料参数和典型的P-I-N设备几何形状,代表甲基铵铅卤化物钙钛矿太阳能电池来说明我们的通用设计原理的应用以改善特定的设备。
The term defect tolerance is widely used in literature to describe materials such as lead-halides which exhibit long non-radiative lifetimes of carriers despite possessing a large concentration of point defects. Studies on defect tolerance of materials mostly look at the properties of the host material and/or the chemical nature of defects that affect the capture coefficients of defects. However, the recombination activity of a defect is not only a function of its capture coefficients alone but are also dependent on the electrostatics and the design of the layer stack of a photovoltaic device. Here we study the influence of device geometry on defect tolerance by combining calculations of capture coefficients with device simulations. We derive generic device design principles which can inhibit recombination inside a photovoltaic device for a given set of capture coefficients based on the idea of slowing down the slower of the two processes (electron and hole capture) even further by modifying electron and hole injection into the absorber layer. We use the material parameters and typical p-i-n device geometry representing methylammonium lead halide perovskites solar cells to illustrate the application of our generic design principles to improve specific devices .