论文标题

通过电场诱导的位错来控制局部电阻

Controlling local resistance via electric-field induced dislocations

论文作者

Evans, D. M., Småbråten, D. R., Holstad, T. S., Vullum, P. E., Mosberg, A. B., Yan, Z., Bourret, E., Van Helvoort, A. T. J., Selbach, S. M., Meier, D.

论文摘要

位错是一维(1D)拓扑线缺陷,晶格偏离了完美的晶体结构。位错的存在超越了凝结物质研究,并引起了各种新兴现象[1-6],从地质效应[7]到二极管的光发射[8]。尽管存在无处不在,但迄今为止,通常通过应变场来实现位错的受控形成,在生长[9,10]或通过变形回顾性地应用,例如(Nano [11-14]) - 压痕[15]。在这里,我们展示了如何使用局部电场诱导部分位错,从而改变了施加场的材料的结构和电子响应。通过结合高分辨率成像技术和密度功能理论计算,我们直接在铁电六角锰矿ER(TI,MN)O3中直接形象这些位错,并研究它们对当地电运行为的影响。使用电场诱导部分位错是一种概念上新的方法,用于新兴缺陷驱动现象的迅速发展领域,并可以在不需要外部宏观应变场的情况下实现局部性质控制。该控制是将未来氧化物电子设备中整合和功能化位错的重要步骤。

Dislocations are one-dimensional (1D) topological line defects where the lattice deviates from the perfect crystal structure. The presence of dislocations transcends condensed matter research and gives rise to a diverse range of emergent phenomena [1-6], ranging from geological effects [7] to light emission from diodes [8]. Despite their ubiquity, to date, the controlled formation of dislocations is usually achieved via strain fields, applied either during growth [9,10] or retrospectively via deformation, e.g., (nano [11-14])-indentation [15]. Here we show how partial dislocations can be induced using local electric fields, altering the structure and electronic response of the material where the field is applied. By combining high-resolution imaging techniques and density functional theory calculations, we directly image these dislocations in the ferroelectric hexagonal manganite Er(Ti,Mn)O3 and study their impact on the local electric transport behaviour. The use of an electric field to induce partial dislocations is a conceptually new approach to the burgeoning field of emergent defect-driven phenomena and enables local property control without the need of external macroscopic strain fields. This control is an important step towards integrating and functionalising dislocations in practical devices for future oxide electronics.

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