论文标题

表面金属的超快产生和腐烂

Ultrafast generation and decay of a surface metal

论文作者

Gierster, Lukas, Vempati, Sesha, Stähler, Julia

论文摘要

化学掺杂或电场诱导的半导体表面的带弯曲会产生金属表面,其散装中未发现的特性,例如高电子迁移率,磁性或超导性。通过BB在Ultrafast TimeScales上通过BB的光学生成将有助于对高速电子设备的半导体的传导,磁性和光学性质进行严重操纵。在这里,我们在光激发时证明了ZnO(10-10)表面(10-10)表面的超快产生。与迄今已知的超快光诱导的半导体到金属转变相比,发生在大部分无机半导体中,ZnO表面的金属化由3-4个数量级较低的光子通量发射。使用时间和角度分辨的光电子光谱法,我们表明相变是由供体型深层表面缺陷的光诱导的向下表面带弯曲引起的。在低光子通量下,形成了表面限制的激子。在临界激子密度上方,发生莫特过渡,导致平衡费米能量下方的部分填充的金属带。该过程类似于半导体表面的化学掺杂。发现的机制不是特定于物质的,并且提供了一条控制金属性的一般途径。

Band bending at semiconductor surfaces induced by chemical doping or electric fields can create metallic surfaces with properties not found in the bulk, such as high electron mobility, magnetism or superconductivity. Optical generation of such metallic surfaces via BB on ultrafast timescales would facilitate a drastic manipulation of the conduction, magnetic and optical properties of semiconductors for high-speed electronics. Here, we demonstrate the ultrafast generation of a metal at the (10-10) surface of ZnO upon photoexcitation. Compared to hitherto known ultrafast photoinduced semiconductor-to-metal transitions that occur in the bulk of inorganic semiconductors, the metallization of the ZnO surface is launched by 3-4 orders of magnitude lower photon fluxes. Using time- and angle-resolved photoelectron spectroscopy, we show that the phase transition is caused by photoinduced downward surface band bending due to photodepletion of donor-type deep surface defects. At low photon flux, surface-confined excitons are formed. Above a critical exciton density, a Mott transition occurs, leading to a partially filled metallic band below the equilibrium Fermi energy. This process is in analogy to chemical doping of semiconductor surfaces. The discovered mechanism is not material-specific and presents a general route for controlling metallicity confined to semiconductor interfaces on ultrafast timescales.

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