论文标题

使用船长CCD对FANO因子的绝对测量

Absolute measurement of the Fano factor using a Skipper-CCD

论文作者

Rodrigues, Dario, Andersson, Kevin, Cababie, Mariano, Donadon, Andre, Botti, Ana, Cancelo, Gustavo, Estrada, Juan, Fernandez-Moroni, Guillermo, Piegaia, Ricardo, Senger, Matias, Haro, Miguel Sofo, Stefanazzi, Leandro, Tiffenberg, Javier, Uemura, Sho

论文摘要

船长CCD可以实现深度子电子读数噪声,从而可以绝对确定从0到1900电子以上的较大范围内的离子化电子数量的绝对确定。在这项工作中,我们提出了一种新型技术,该技术利用了这种独特的能力来允许自校准和硅特性的最终确定。我们对差异进行了绝对测量,以及由$^{55} $ fe X射线产生的电荷分布的平均值,在123K和5.9 KEV中获得SI的FANO因子绝对测量。发现了0.119 $ \ pm $ 0.002的值,并且确定电子孔对创建能量为(3.749 $ \ pm $ 0.001)EV。这项技术为低能能以直接测量FANO因子打开了机会。

Skipper-CCD can achieve deep sub-electron readout noise making possible the absolute determination of the exact number of ionized electrons in a large range, from 0 to above 1900 electrons. In this work we present a novel technique that exploits this unique capability to allow self-calibration and the ultimate determination of silicon properties. We performed an absolute measurement of the variance and the mean number of the charge distribution produced by $^{55}$Fe X-rays, getting a Fano factor absolute measurement in Si at 123K and 5.9 keV. A value of 0.119 $\pm$ 0.002 was found and the electron-hole pair creation energy was determined to be (3.749 $\pm$ 0.001) eV. This technology opens the opportunity for direct measurements of the Fano factor at low energies.

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