论文标题
XUV诱导了通过高谐波吸收光谱研究研究的锡氧笼光照射天
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
论文作者
论文摘要
无机分子材料（例如锡氧笼子）是与最近开发的极端紫外线（EUV）光刻技术兼容的有前途的光孔剂。因此，对暴露后光扰动物发生的光子诱导的反应的详细理解很重要。我们使用XUV宽带激光脉冲在25-40 eV的范围内，从桌面高谐波源来揭示通过XUV吸收光谱镜像在某些光诱导的化学上抗脱落的锡氧笼的薄膜。在暴露期间，记录了传输光谱，并观察到抗性中明显的吸光度下降。提取DILL参数以量化XUV诱导的转化率，并与92 eV的EUV暴露结果进行比较。基于吸收变化，我们估计在暴露结束时将大约60％的锡碳键裂解。
Inorganic molecular materials such as tin oxo cages are a promising generation of photoresists compatible with the demands of the recently developed Extreme UltraViolet (EUV) lithography technology. Therefore, a detailed understanding of the photon-induced reactions which occur in photoresists after exposure is important. We used XUV broadband laser pulses in the range of 25-40 eV from a table-top high-harmonic source to expose thin films of the tin oxo cage resist to shed light on some of the photo-induced chemistry via XUV absorption spectroscopy. During the exposure, the transmitted spectra were recorded and a noticeable absorbance decrease was observed in the resist. Dill parameters were extracted to quantify the XUV induced conversion and compared to EUV exposure results at 92 eV. Based on the absorption changes, we estimate that approximately 60% of tin-carbon bonds are cleaved at the end of the exposure.
