论文标题
IV-V组六边形二进制单层的预测
Prediction of group IV-V hexagonal binary monolayers
论文作者
论文摘要
IV组和V单层是非常关键的2D材料,用于其高载体迁移率,可调节带隙和光学线性二色性。最近,一种新型的IV-V二进制化合物SN2BI已在硅底物上合成,并且显示出非常有趣的电子特性。进一步的研究表明,单层将通过氢化以独立形式稳定。受到第一原则计算的启发,我们系统地预测和研究了SN2BI的八个对应物,即SI2P,SI2AS,SI2SB,SI2BI,SI2BI,GE2P,GE2P,GE2AS,GE2AS,GE2SB和GE2BI。凝聚力,声子分散和AIMD计算表明,与SN2BI相似,所有这些独立的单层均以氢化形式稳定。这些氢化单层是具有宽带隙的半导体,有利于光电的目的。 SI2YH2和GE2YH2结构分别具有间接和直接带隙。它们代表了非常有趣的光学特性,例如可见区域中的良好吸收和线性二色性,这对于太阳能电池和梁拆分设备至关重要。最后,SI2SBH2和SI2BIH2单层具有合适的带隙和带边缘的位置,用于光催化水分裂。总而言之,我们的调查为这个二进制化合物家族提供了非常有趣和有希望的特性。我们希望我们的预测为新的实验研究和制造合适的2D材料的方式开放,用于下一代光电和光催化装置。
Group IV and V monolayers are very crucial 2D materials for their high carrier mobilities, tunable band gaps, and optical linear dichroism. Very recently, a novel group IV-V binary compound, Sn2Bi, has been synthesized on silicon substrate, and has shown very interesting electronic properties. Further investigations have revealed that the monolayer would be stable in freestanding form by hydrogenation. Inspired by this, by means of first-principles calculations, we systematically predict and investigate eight counterparts of Sn2Bi, namely Si2P, Si2As, Si2Sb, Si2Bi, Ge2P, Ge2As, Ge2Sb, and Ge2Bi. The cohesive energies, phonon dispersions, and AIMD calculations show that, similar to Sn2Bi, all of these freestanding monolayers are stable in hydrogenated form. These hydrogenated monolayers are semiconductors with wide band gaps, which are favorable for opto-electronic purposes. The Si2YH2 and Ge2YH2 structures possess indirect and direct band gaps, respectively. They represent very interesting optical characteristics, such as good absorption in the visible region and linear dichroism, which are crucial for solar cell and beam-splitting devices, respectively. Finally, the Si2SbH2 and Si2BiH2 monolayers have suitable band gaps and band edge positions for photocatalytic water splitting. Summarily, our investigations offer very interesting and promising properties for this family of binary compounds. We hope that our predictions open ways to new experimental studies and fabrication of suitable 2D materials for next generation opto-electronic and photocatalytic devices.