论文标题
在节点线半径 - 渗透连接器中的双重Andreev反射和双重正常反射
Double Andreev reflections and double normal reflections in nodal-line semimetal-superconductor junctions
论文作者
论文摘要
我们使用扩展的Blonder-Tinkham-klapwijk理论系统地研究了节点线半学性渗透连接器中的散射过程和电导光谱。发现了奇特的四个四倍反射的共存，这是镜面正常反射，复古正常反射，镜面的Andreev反射和恢复的Andreevev反射。在各种参数值（例如界面屏障高度，化学势和轨道耦合强度）的各种值下研究了双重正常反射和双重Andreev反射的入射角依赖性和二颗粒能依赖性。发现可以通过调整这些参数来控制反射及其幅度的外观和消失。从频带结构的角度分析了反射的散射机制。我们还研究了连接的电导光谱，该连接谱显示出关于淋巴结线和界面的方向关系的独特特征和强烈的各向异性。连接中发现的独特散射过程和电导光谱有助于设计超导电子设备并在实验中搜索材料中的节点线。
We study systematically the scattering processes and the conductance spectra in nodal-line semimetalsuperconductor junctions using the extended Blonder-Tinkham-Klapwijk theory. The coexistence of peculiar quadruple reflections are found, which are the specular normal reflection, the retro-normal reflection, the specular Andreev reflection and the retro-Andreev reflection. The incident angle dependence and the quasiparticle energy dependence of the double normal reflections and the double Andreev reflections are investigated under various values of parameters such as the interfacial barrier height, the chemical potentials, and the orbital coupling strength. It is found that the appearance and the disappearance of the reflections and their magnitudes can be controlled through tuning these parameters. The scattering mechanism for the reflections are analyzed in details from the viewpoint of the band structure. We also investigate the conductance spectra for the junctions, which show distinctive features and strong anisotropy about the orientation relationships of the nodal line and interface. The unique scattering processes and conductance spectra found in the junctions are helpful in designing superconducting electronic devices and searching for the nodal line in materials experimentally.
