论文标题

在溅射的Thulium铁石榴石超薄薄膜和TIG/AU/TIG阀结构中,应变调节的磁各向异性

Strain-Tuned Magnetic Anisotropy in Sputtered Thulium Iron Garnet Ultrathin Films and TIG/Au/TIG Valve Structures

论文作者

Vilela, Gilvânia, Chi, Hang, Stephen, Gregory, Settens, Charles, Zhou, Preston, Ou, Yunbo, Suri, Dhavala, Heiman, Don, Moodera, Jagadeesh

论文摘要

通过控制菌株来定义铁磁性绝缘体膜中的平面或平面易于轴的磁各向异性,同时保持高质量的表面是Spintronic and Magnonic应用。我们研究了调整无定形溅射超薄超薄铁石榴石(TIG)膜各向异性的方法,从而通过厚度(7.5至60 nm),底物选择(GGG和SGGG)和结晶过程来量身定制其磁性。我们将形态学和结构特性与生长后退火后膜的磁各向异性相关联。在600°C退火的30 nm厚膜显示出有利于平面磁各向异性(IPMA)的压缩应变,而在800°C以上退火的膜则在拉伸应变下,导致垂直磁各向异性(PMA)。空气解散的膜具有高度的结晶度和接近大容量值的磁化饱和度。这些结果导致成功制造了Tig/au/tig,并在TIG层之间取决于AU厚度。这些结果将有助于使用TIG来创建基本接口交换研究的各种原位清洁混合结构,并朝着复杂设备的开发开发。此外,溅射技术是有利的,因为它可以轻松地用于工业应用。

Defining the magnetic anisotropy for in-plane or out-of-plane easy axis in ferrimagnetic insulators films by controlling the strain, while maintaining high-quality surfaces, is desirable for spintronic and magnonic applications. We investigate ways to tune the anisotropy of amorphous sputtered ultrathin thulium iron garnet (TIG) films, and thus tailor their magnetic properties by the thickness (7.5 to 60 nm), substrate choice (GGG and SGGG), and crystallization process. We correlate morphological and structural properties with the magnetic anisotropy of post-growth annealed films. 30 nm thick films annealed at 600 °C show compressive strain favoring an in-plane magnetic anisotropy (IPMA), whereas films annealed above 800 °C are under a tensile strain leading to a perpendicular magnetic anisotropy (PMA). Air-annealed films present a high degree of crystallinity and magnetization saturation close to the bulk value. These results lead to successful fabrication of trilayers TIG/Au/TIG, with coupling between the TIG layers depending on Au thickness. These results will facilitate the use of TIG to create various in situ clean hybrid structures for fundamental interface exchange studies, and towards the development of complex devices. Moreover, the sputtering technique is advantageous as it can be easily scaled up for industrial applications.

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